首页> 外文OA文献 >Optical evidence of blue shift in topological insulator bismuth selenide in the few-layer limit
【2h】

Optical evidence of blue shift in topological insulator bismuth selenide in the few-layer limit

机译:拓扑绝缘体硒化铋蓝移的光学证据   在少数层限制

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

Optical band gap properties of high-quality few-layer topological insulatorBi2Se3 thin films grown with magnetron sputtering are investigated usingbroadband absorption spectroscopy. We provide direct optical evidence of arigid blue-shift to up to 0.5 eV in the band gap of Bi2Se3 as it approaches thetwo-dimensional limit. The onset of this behavior is most significant below sixquintuple layers. The blue shift is very robust and is observed in bothprotected (capped) and exposed (uncapped) thin films. Our results areconsistent with observations that finite-size effects have profound impact onthe electronic character of topological insulators, particularly when the topand bottom surface states are coupled. Our result provides new insights, andthe need for deeper investigations, into the scaling behavior of topologicalmaterials before they can have significant impact on electronic applications.
机译:利用宽带吸收光谱研究了磁控溅射法制备的高质量几层拓扑绝缘体Bi2Se3薄膜的光学带隙特性。我们提供了直接的光学证据,证明Bi2Se3的带隙接近二维极限时,其蓝移高达0.5 eV。在六重五层以下,此行为的发作最为明显。蓝移非常稳健,并且在受保护(加盖)和曝光(未加盖)的薄膜中均可见到。我们的结果与以下观察结果一致:有限尺寸效应对拓扑绝缘子的电子特性产生了深远的影响,尤其是当顶部和底部表面状态耦合时。我们的结果为拓扑材料对电子应用产生重大影响之前,对拓扑材料的缩放行为提供了新的见解,并需要进行更深入的研究。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
代理获取

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号